32nm Overlay Improvement CapabilitiesEICHELBERGER, Brad; HUANG, Kevin; O'BRIEN, Kelly et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244C.1-69244C.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Applications of TM polarized illuminationSMITH, Bruce; JIANMING ZHOU; PENG XIE et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69240J.1-69240J.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Development of a Computational Lithography RoadmapFUNG CHEN, J; LIU, Hua-Yu; LAIDIG, Thomas et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241C.1-69241C.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

High-n Immersion LithographySEWELL, Harry; MULKENS, Jan; GRAEUPNER, Paul et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692415.1-692415.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

If it moves, simulate it!NEUREUTHER, Andrew.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, Part II, 692402.1-692402.15Conference Paper

Latest Developments on Immersion Exposure SystemsMULKENS, Jan; DE KLERK, Jos; LEENDERS, Martijn et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241P.1-69241P.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Pellicle effect on OPC modelingBOREN LUO; CHANG, Chi-Kang; WANG, W. L et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243T.1-69243T.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Split and Design Guidelines for Double PatterningWIAUX, Vincent; VERHAEGEN, Staf; CHENG, Shaunee et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692409.1-692409.11, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Studies of High Index Immersion LithographyOHMURA, Yasuhiro; NAGASAKA, Hiroyuki; MATSUYAMA, Tomoyuki et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692413.1-692413.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Extreme Mask Corrections : Technology and BenefitsGRANIK, Yuri; COBB, Nick; MEDVEDEV, Dmitry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243W.1-69243W.15, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Multi-Patterning Overlay ControlAUSSCHNITT, C. P; DASARI, P.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692448.1-692448.5, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Thermal aberration control in projection lensNAKASHIMA, Toshiharu; OHMURA, Yasuhiro; OGATA, Taro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241V.1-69241V.9, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

Double Printing through the use of Ion ImplantationSAMARAKONE, Nandasiri; YICK, Paul; ZAWADZKI, Mary et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69242B.1-69242B.13, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Variable Loading Kernels for OPC ModelingTSAI, S. L; LO, Fred; YANG, Elvis et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243X.1-69243X.9, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Proposal for determining exposure latitude requirementsLEVINSON, Harry J; YUANSHENG MA; KOENIG, Marcel et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241J.1-69241J.10, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

SEM-Contour Based Mask ModelingVASEK, Jim; TEJNIL, Edita; KUSNADI, Ir et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244Q.1-69244Q.11, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

An analysis of double exposure lithography optionsLEE, Saul; BYERS, Jeffrey; JEN, Kane et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69242A.1-69242A.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Reflection control in hyper-NA immersion lithographyZHIMIN ZHU; PISCANI, Emil; EDWARDS, Kevin et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244A.1-69244A.7, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

The Flash Memory battle : How low can we go?VAN SETTEN, Eelco; WISMANS, Onno; GRIM, Kees et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69244I.1-69244I.14, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

An Intelligent Imaging System for ArF ScannerMATSUYAMA, Tomoyuki; OHMURA, Yasuhiro; NAKASHIMA, Toshiharu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69241S.1-69241S.9, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

An approach for nanometer trench and hole formationZHONGYAN WANG; MING SUN; XILIN PENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692447.1-692447.8, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Development of Layout Split Algorithms and Printability Evaluation for Double Patterning TechnologyCHIOU, Tsann-Bim; SOCHA, Robert; HONG CHEN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243M.1-69243M.10, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Evaluation of OPC Test Patterns using Parameter SensitivityWARD, Brian S.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 69243S.1-69243S.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper

Interactions of double patterning technology with wafer processing, OPC and design flowsLUCAS, Kevin; CORK, Chris; MILOSLAVSKY, Alex et al.Proceedings of SPIE, the International Society for Optical Engineering. 2008, pp 692403.1-692403.12, issn 0277-786X, isbn 978-0-8194-7109-3Conference Paper